University Chemistry ›› 2018, Vol. 33 ›› Issue (12): 51-55.doi: 10.3866/PKU.DXHX201804005

• Chemistry Laboratory • Previous Articles     Next Articles

Improvement of Gas Flow Control Device for Saturated Vapor Pressure Measurements

Yunhua CHEN*(),Chuqing GONG,Haibo ZHANG,Lizhi DENG,Chunlan XIA   

  • Received:2018-04-04 Published:2018-12-14
  • Contact: Yunhua CHEN E-mail:chenyh@whu.edu.cn

Abstract:

In the static method of saturated vapor pressure measurements, the key operation is to adjust the pressure of the system. Because of the invisibility of the gas, it is difficult to control the air flow, which often results in air pouring into the system due to excessive air flow in the constant pressure adjustment process. By designing a mini gas flow control device, the control operation is visualized; thus, problems associated with controlling the air flow can be avoided. Furthermore, frequent adjustment of the air flow becomes unnecessary, greatly reducing the lab hour.

Key words: Physical chemistry experiment, Saturated vapor pressure, Isopiestic adjustment

MSC2000: 

  • G64